S neox Grand Format、应用说明和出版物

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文档

S neox Grand Format 宣传册

应用

我们的产品旨在解决半导体、微电子、光学和表面处理领域的检测要求。我们的产品覆盖了先进制造业和消费电子产品的巨大市场。

案例研究

就地计量学用于CMP中的垫面监测

17 April, 2023 CMP, 案例研究, 消费类电子产品

鉴于CMP过程中表面之间的机械相互作用是该过程所有阶段的关键变量，因此对于CMP过程的表面测量的需求是显而易见的。在整个过程中需要定期进行表征的表面包括调节盘表面、晶圆表面和垫片表面。

通过全内反射产生结构颜色的表面的表征

10 February, 2021 光学组件, 增材制造, 未分类, 案例研究

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文档

S neox Grand Format 宣传册

应用

PCB

半导体

显示屏幕

案例研究

就地计量学用于CMP中的垫面监测

维尔戈干涉仪仪器挡板的粗糙度表征

表征温度诱导的硅晶片形状和纹理演变

通过全内反射产生结构颜色的表面的表征

解答您的疑问！
与专家联系

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解答您的疑问！
与专家联系

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文档

S neox Grand Format 宣传册

应用

PCB

半导体

显示屏幕

案例研究

就地计量学用于CMP中的垫面监测

维尔戈干涉仪仪器挡板的粗糙度表征

表征温度诱导的硅晶片形状和纹理演变

通过全内反射产生结构颜色的表面的表征

解答您的疑问！ 与专家联系

只需给我们发送电子邮件或搜索 您附近的直接联系人即可。

解答您的疑问！ 与专家联系

只需给我们发送电子邮件或搜索 您附近的直接联系人即可。

解答您的疑问！
与专家联系

只需给我们发送电子邮件或搜索
您附近的直接联系人即可。

解答您的疑问！
与专家联系

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您附近的直接联系人即可。